Clean Room

The 4000 sq ft. shared facility cleanroom in the Engineering Sciences Building consists of 3,300 square feet of clean space with 800 sq. ft. of additional support area providing 18 megaohm DI water, closed cycle cooling water system, nitrogen, compressed air, and vacuum to the clean space. The shared cleanroom has three distinct zones which will house all the equipment currently in the current fab lab plus additional needed systems. 1.) A Class 100 photolithography room with three mask aligners and a dual spinner hood with hotplates for photoresist thermal processing. 2.) A Class 1,000 wet processing room equipped with eight foot acid and solvent benches, a photoresist development bench and two additional hoods for nonstandard new processes. The class 1,000 space hs areas for optical inspection and thin film measurements. 3.) Two Class 10,000 rooms, one for dry processing room, house equipment for thermal processing, thin film deposition, metallization and plasma etching, and the second serves as a growth room and houses a MOCVD system. The cleanroom use is free for the University affiliates.